<mods:mods xmlns:mods="http://www.loc.gov/mods/">
    <mods:titleInfo>
      <mods:title>Papers from the First International Workshop on Plasma-Based Ion Implantation :</mods:title>
      <mods:subtitle>4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin /</mods:subtitle>
    </mods:titleInfo>
    <mods:name type="conference">
      <mods:namePart>International Workshop on Plasma-Based Ion Implantation 1993 : University of Wisconsin--Madison)</mods:namePart>
      <mods:role>
        <mods:text>creator</mods:text>
      </mods:role>
    </mods:name>
    <mods:name type="personal">
      <mods:namePart>Conrad, John R</mods:namePart>
    </mods:name>
    <mods:name type="personal">
      <mods:namePart>Sridharan, Kumar</mods:namePart>
    </mods:name>
    <mods:name type="corporate">
      <mods:namePart>Applied Science and Technology (ASTeX), Inc</mods:namePart>
    </mods:name>
    <mods:typeOfResource>text</mods:typeOfResource>
    <mods:genre authority="marc">bibliography</mods:genre>
    <mods:genre authority="marc">conference publication</mods:genre>
    <mods:originInfo>
      <mods:place>
        <mods:code authority="marc">nyu</mods:code>
        <mods:text>New York</mods:text>
      </mods:place>
      <mods:publisher>Published for the American Vacuum Society by the American Institute of Physics</mods:publisher>
      <mods:dateIssued>1994</mods:dateIssued>
      <mods:issuance>monographic</mods:issuance>
    </mods:originInfo>
    <mods:language authority="iso639-2b">eng</mods:language>
    <mods:physicalDescription>
      <mods:form authority="marcform">print</mods:form>
      <mods:extent>p. 813-998 : ill. ; 30 cm.</mods:extent>
    </mods:physicalDescription>
    <mods:note type="statement of responsibility">sponsored by Applied Science and Technology (ASTeX), Inc. ... [et al.] ; editors for the workshop, John R. Conrad, Kumar Sridharan.</mods:note>
    <mods:note>"Published in both 1994 March/April issue of the Journal of vacuum science and technology B, vol. 12, no. 2"--T.p. verso.</mods:note>
    <mods:note>Includes bibliographical references and index.</mods:note>
    <mods:subject authority="lcsh">
      <mods:topic>Ion implantation</mods:topic>
      <mods:topic>Congresses</mods:topic>
    </mods:subject>
    <mods:classification authority="lcc">TS695.25 .I57 1993</mods:classification>
    <mods:classification edition="21" authority="ddc">621.3815/2</mods:classification>
    <mods:relatedItem type="host">
      <mods:titleInfo>
        <mods:title>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena.</mods:title>
        <mods:partNumber>2nd ser., v. 12, no. 2</mods:partNumber>
      </mods:titleInfo>
      <mods:identifier type="issn">1071-1023</mods:identifier>
      <mods:identifier type="local">(OCoLC)23276603</mods:identifier>
      <mods:identifier type="local">(DLC)sn 92021098</mods:identifier>
    </mods:relatedItem>
    <mods:identifier type="isbn">1563963442</mods:identifier>
    <mods:identifier type="lccn">97129132</mods:identifier>
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      <mods:recordContentSource>DLC</mods:recordContentSource>
      <mods:recordCreationDate encoding="marc">940504</mods:recordCreationDate>
      <mods:recordChangeDate encoding="iso8601">19970618142736.9</mods:recordChangeDate>
      <mods:recordIdentifier>4968605</mods:recordIdentifier>
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