<?xml version="1.0" encoding="UTF-8"?>
<!-- edited with XMLSPY v2004 rel. 2 U (http://www.xmlspy.com) by Jacqueline Radebaugh (Library of Congress) -->
<mods xmlns:xlink="http://www.w3.org/1999/xlink" version="3.0" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns="http://www.loc.gov/mods/v3" xsi:schemaLocation="http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-0.xsd">
	<titleInfo>
		<title>Papers from the First International Workshop on Plasma-Based Ion Implantation :</title>
		<subTitle>4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin /</subTitle>
	</titleInfo>
	<name type="conference">
		<namePart>International Workshop on Plasma-Based Ion Implantation 1993 : University of Wisconsin--Madison)</namePart>
		<role>
			<roleTerm type="text">creator</roleTerm>
		</role>
	</name>
	<name type="personal">
		<namePart>Conrad, John R</namePart>
	</name>
	<name type="personal">
		<namePart>Sridharan, Kumar</namePart>
	</name>
	<name type="corporate">
		<namePart>Applied Science and Technology (ASTeX), Inc</namePart>
	</name>
	<typeOfResource>text</typeOfResource>
	<genre authority="marcgt">bibliography</genre>
	<genre authority="marcgt">conference publication</genre>
	<originInfo>
		<place>
			<placeTerm authority="marccountry" type="code">nyu</placeTerm>
		</place>
		<place>
			<placeTerm type="text">New York</placeTerm>
		</place>
		<publisher>Published for the American Vacuum Society by the American Institute of Physics</publisher>
		<dateIssued>1994</dateIssued>
		<issuance>monographic</issuance>
	</originInfo>
	<language>
		<languageTerm authority="iso639-2b" type="code">eng</languageTerm>
	</language>
	<physicalDescription>
		<form authority="marcform">print</form>
		<extent>p. 813-998 : ill. ; 30 cm.</extent>
	</physicalDescription>
	<note type="statement of responsibility">sponsored by Applied Science and Technology (ASTeX), Inc. ... [et al.] ; editors for the workshop, John R. Conrad, Kumar Sridharan.</note>
	<note>"Published in both 1994 March/April issue of the Journal of vacuum science and technology B, vol. 12, no. 2"--T.p. verso.</note>
	<note>Includes bibliographical references and index.</note>
	<subject authority="lcsh">
		<topic>Ion implantation</topic>
		<topic>Congresses</topic>
	</subject>
	<classification authority="lcc">TS695.25 .I57 1993</classification>
	<classification edition="21" authority="ddc">621.3815/2</classification>
	<relatedItem type="host">
		<titleInfo>
			<title>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena.</title>
			<partNumber>2nd ser., v. 12, no. 2</partNumber>
		</titleInfo>
	</relatedItem>
	<recordInfo>
		<recordContentSource>DLC</recordContentSource>
		<recordCreationDate encoding="marc">940504</recordCreationDate>
		<recordChangeDate encoding="iso8601">19970618142736.9</recordChangeDate>
		<recordIdentifier>4968605</recordIdentifier>
	</recordInfo>
</mods>
